a) Preparation of layers of semiconductor materials (e.g. titanium dioxide, tungsten oxide, iron oxide) using various chemical and physico-chemical procedures
b) Development of standard methods (ISO, CEN) for testing of selfcleaning and disinfection effects of photocatalytic surfaces,
c) Construction of various types of laboratory photoreactors for photocatalytic cleaning and disinfecting in liquid and gaseous phase and their testing in order to optimize the working conditions
d) Study of the kinetics of oxidative degradation of organic pollutants and photocatalytic inactivation of microorganisms
e) Development of semiconductor materials for photoelectrochemical water splitting using sunlight
